Download Audio Listening Bahasa Inggris Smp >>> DOWNLOAD

Download Audio Listening Bahasa Inggris Smp >>> DOWNLOAD

Hall of Fame External links SMPK UAN Yogyakarta SMPK UAN Malang SMPK UAN Surabaya SMPK UAN Bandung Category:Distance education Category:Standardized tests1. Field of the Invention The present invention relates to a transparent conductive film to be used for various display devices such as a liquid crystal display, plasma display, electroluminescence display and a touch panel, and a method for producing the same. The invention also relates to a display device using the transparent conductive film. 2. Description of the Related Art An indium tin oxide (ITO) film is a kind of transparent conductive film that has been mainly used for such as a film used as a transparent electrode of a display such as a liquid crystal display, plasma display or electroluminescence display and a film used as a touch panel electrode. Recently, a transparent conductive film having a smaller specific resistance and a higher resistance to chemicals has been required with a high definition display and a touch panel. To obtain such a transparent conductive film, a sputtering method, a vacuum vapor deposition method or a chemical vapor deposition method is used. Among these methods, a chemical vapor deposition method is a simple method. Moreover, the film thickness is controlled in a vacuum chamber. Thus, the production cost is low. However, the chemical vapor deposition method involves a problem that the manufacturing time is long. A film is generally produced by forming a single film by a vacuum vapor deposition method and by using a reactive gas and then by performing heat treatment. In this case, a step of forming the single film using the vacuum vapor deposition method is needed before the heat treatment. Thus, the manufacturing time is long. A plasma treatment can be used as a method of forming a single film to solve such a problem. However, it is difficult to form a high-quality film by such a plasma treatment, and it is difficult to introduce a reactive gas into a vacuum chamber. Furthermore, a step of forming an electrode for plasma generation is needed. Thus, the manufacturing cost is high. Moreover, the plasma treatment has a disadvantage that the plasma damages a vacuum chamber in the worst case. To avoid the above problem, Japanese Patent Application Laid-Open (JP-A) Nos. 63-146660, 07-133685 and 09-125332 suggest a method for forming a film using a vacuum

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